Resist composition and patterning process using the same
US7771913B2 · kind B2 · utility
48Cited by
26References
27Claims
0Family size
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Key dates
| Filing date | Mar 30, 2007 |
| Grant date | Aug 10, 2010 |
| Priority date | — |
| Expiry date | Apr 11, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
There is disclosed a resist composition comprising, at least, a polymer including repeating units represented by the following general formula (1). There can be provided a resist composition that has a good barrier property against water, prevents resist components from leaching to water, has high receding contact angle against water, does not require a protective film, has an excellent process applicability, suitable for the liquid immersion lithography and makes it possible to form micropatterns with high precision.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.