Method for production of a very thin layer with thinning by means of induced self-support
US7776714B2 · kind B2 · utility
0Cited by
11References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 3, 2004 |
| Grant date | Aug 17, 2010 |
| Priority date | — |
| Expiry date | Feb 2, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/76254
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The invention relates to a process for obtaining a thin layer made of a first material on a substrate made of a second material called the final substrate, including the following steps:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.