Lithographic apparatus and device manufacturing method
US7779781B2 · kind B2 · utility
41Cited by
29References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 28, 2004 |
| Grant date | Aug 24, 2010 |
| Priority date | — |
| Expiry date | Feb 1, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.