Micromachined gas and liquid concentration sensor and method of making the same
US7780343B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 9, 2007 |
| Grant date | Aug 24, 2010 |
| Priority date | — |
| Expiry date | Jul 9, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01F1/692
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A device with micromachined (a.k.a. MEMS, Micro Electro Mechanical Systems) silicon sensor to measure gas or liquid concentration in a binary mixture formality is disclosed in the present invention. A process for fabricating the said MEMS silicon concentration sensor, which thereby can greatly reduce the sensor fabrication cost by a batch production, is revealed as well. This MEMS process can mass-produce the sensors on silicon substrate in the ways of small size, low power, and high reliability. In addition to the gas or liquid concentration measurement, the present invention further discloses that the said sensor can also readily measure gas or liquid mass flow rate while record the concentration data, which is not viable by other related working principle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.