Beam irradiation apparatus with deep ultraviolet light emission device for lithographic pattern inspection system
US7781749B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 7, 2008 |
| Grant date | Aug 24, 2010 |
| Priority date | — |
| Expiry date | Dec 23, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/95607
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An illumination beam irradiation apparatus for use in pattern inspection systems is disclosed, which is less in deterioration of optical components and in attenuation of illumination light. The illumination apparatus includes a light source which yields a fundamental wave, a beam-shaper unit which performs beam-shaping of the fundamental wave so that this wave has a prespecified shape, and a pattern generator unit which operates, upon receipt of the beam-shaped fundamental wave, to convert this incoming wave into illumination light with a shorter wavelength to thereby generate illumination light of a prespecified shape. The illuminator also includes an image relay unit for guiding the illumination light that was generated by the pattern generator to fall onto a workpiece under inspection, such as a photomask or else.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.