Patent · US Active

Method and system for context-specific mask writing

US7784016B2 · kind B2 · utility

3Cited by

40References

21Claims

0Family size

Assignee

Cadence Design Systems, Inc. · US

Inventors

Robert C. Pack · Foster City, US
Louis K. Scheffer · Campbell, US

Key dates

Filing date	Jul 23, 2007
Grant date	Aug 24, 2010
Priority date	—
Expiry date	Dec 5, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/78
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method for generating lithography masks includes generating integrated circuit design data and using context information from the integrated circuit design data to write a mask.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.