Photomask blank
US7790339B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Apr 19, 2007 |
| Grant date | Sep 7, 2010 |
| Priority date | — |
| Expiry date | Sep 22, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31616
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photomask blank has a light-shielding film composed of a single layer of a material containing a transition metal, silicon and nitrogen or a plurality of layers that include at least one layer made of a material containing a transition metal, silicon and nitrogen, and has one or more chrome-based material film. The high transition metal content ensures electrical conductivity, preventing charge-up in the photomask production process, and also provides sufficient chemical stability to cleaning in photomask production. The light-shielding film has a good resistance to dry etching of the chrome-based material film in the presence of chlorine and oxygen, thus ensuring a high processing accuracy.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.