Profiling solid state samples
US7791071B2 · kind B2 · utility
8Cited by
89References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 14, 2006 |
| Grant date | Sep 7, 2010 |
| Priority date | — |
| Expiry date | Nov 24, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F39/8063
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
Methods and apparatus may operate to position a sample, including an imager lens surface, within a processing chamber. Further activities may include creating a layer of reactive material in proximity with the imager lens surface, and exciting a portion of the layer of reactive material in proximity with the imager lens surface to form chemical radicals. Additional activities may include removing a portion of the material in proximity to the excited portion of the imager lens surface to a predetermined level, and continuing the creating, exciting and removing actions until at least one of a plurality of stop criteria occurs.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.