Patent · US Active

Integrated microphone

US7795695B2 · kind B2 · utility

115Cited by
63References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 27, 2006
Grant dateSep 14, 2010
Priority date
Expiry dateApr 6, 2029

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH04R19/04
  • WIPO fieldAudio-visual technology
  • WIPO sectorElectrical engineering

Abstract

A method of forming a microphone having a variable capacitance first deposits high temperature deposition material on a die. The high temperature material ultimately forms structure that contributes to the variable capacitance. The method then forms circuitry on the die after depositing the deposition material. The circuitry is configured to detect the variable capacitance.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.