Patent · US Expired

Sputtering cathode and device and method for coating a substrate with several layers

US7799179B2 · kind B2 · utility

16Cited by

20References

19Claims

0Family size

Assignee

SINGULUS TECHNOLOGIES AG · DE

Inventors

Wolfram Maass · Gelnhausen, DE
Roland Schneider · Schotten, DE
Uwe MÜHLFELD · Bad Mergentheim, DE
Christoph Mundorf · Alzenau, DE
Berthold Ocker · Hanau, DE
Jürgen Langer · Offenbach, DE
Dietmer Schneider · Blankenloch, DE
Helmut John · Munich, DE
Rudi Spielvogel · Bitburg, DE
Eric Claussen · Hanau, DE
Wolfgang Stern · Hanau, DE
Helmut Lausmann · Ortenburg, DE
Matthias Landmann · Mainaschaff, DE
Reinhard Sommerfeld · Lutherstadt Eisleben, DE

Key dates

Filing date	Feb 18, 2003
Grant date	Sep 21, 2010
Priority date	—
Expiry date	Jul 22, 2024

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3405
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

The invention relates to a sputtering cathode (1) for coating a substrate (6), which comprises a device (5) for generating an external magnetic field with substantially parallel magnetic field lines (8) substantially in the plane of the substrate. The invention further relates to a device and a method for coating a substrate with several layers, whereby several sputtering cathodes are disposed in a circle with their target effective areas pointing radially outward.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.