Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition
US7799505B2 · kind B2 · utility
14Cited by
3References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 23, 2007 |
| Grant date | Sep 21, 2010 |
| Priority date | — |
| Expiry date | Oct 23, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/123
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention is related to an arylsulfonium salt compound having a polycyclic hydrocarbon structure in a cation moiety.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.