Light emitting diode structure and method for fabricating the same
US7799593B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 10, 2009 |
| Grant date | Sep 21, 2010 |
| Priority date | — |
| Expiry date | Aug 10, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02647
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention discloses a light emitting diode structure and a method for fabricating the same. In the present invention, a substrate is placed in a solution to form a chemical reaction layer. Next, the substrate is etched to form a plurality of concave zones and a plurality of convex zones with the chemical reaction layer overhead. Next, the chemical reaction layer is removed to form an irregular geometry of the concave zones and convex zones on the surface of the substrate. Then, a semiconductor light emitting structure is epitaxially formed on the surface of the substrate. Thereby, the present invention can achieve a light emitting diode structure having improved internal and external quantum efficiencies.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.