Norbornene-type polymers, compositions thereof and lithographic process using such compositions
US7799883B2 · kind B2 · utility
3Cited by
8References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 22, 2006 |
| Grant date | Sep 21, 2010 |
| Priority date | — |
| Expiry date | Feb 22, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Embodiments of the present invention relate generally to non-self imageable and imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and the immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming imaging layer and top-coat layers for overlying such imaging layers in immersion lithographic process and the process thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.