Determining dopant information
US7804068B2 · kind B2 · utility
9Cited by
83References
26Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 11, 2007 |
| Grant date | Sep 28, 2010 |
| Priority date | — |
| Expiry date | Mar 27, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods that include using a noble gas ion beam to determine dopant information for a sample are disclosed, the dopant information including dopant concentration in the sample, dopant location in the sample, or both.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.