Methods, assemblies and systems for inspecting a photomask
US7808629B2 · kind B2 · utility
2Cited by
3References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 1, 2007 |
| Grant date | Oct 5, 2010 |
| Priority date | — |
| Expiry date | Sep 27, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/95607
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of inspecting a photomask, the method comprising, inspecting at least a portion of the photomask to provide a location of defects having with a first resolution, determining at least one defect region in the location of the defects, the defect region having a defect therein, and imaging the at least one defect region to provide a defect image having a second resolution that is finer than the first resolution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.