Kwon-Taek Lim
6Patents
3h-index
18Co-inventors
50Inventor score
Filing activity: May 23, 2007 → Sep 12, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8084367B2 | Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods | Emerging Cross-Sectional Technologies | 7 | Active |
| US8790470B2 | Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods | Emerging Cross-Sectional Technologies | 6 | Active |
| US8585917B2 | Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods | Emerging Cross-Sectional Technologies | 4 | Active |
| US8889563B2 | Method and apparatus for etching the silicon oxide layer of a semiconductor substrate | Performing Operations; Transporting | 3 | Active |
| US7808629B2 | Methods, assemblies and systems for inspecting a photomask | Physics | 2 | Active |
| US11004675B2 | Substrate cleaning composition, substrate treating method, and substrate treating apparatus | Chemistry; Metallurgy | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.