Self-correcting multivariate analysis for use in monitoring dynamic parameters in process environments
US7809450B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 5, 2006 |
| Grant date | Oct 5, 2010 |
| Priority date | — |
| Expiry date | Sep 18, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B23/0254
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
A method and apparatus for process monitoring are provided. Process monitoring includes (i) generating a multivariate analysis reference model of a process environment from data corresponding to monitored parameters of the process environment; (ii) designating at least one of the monitored parameters as being correlated to maturation of the process environment; (iii) collecting current process data corresponding to the monitored parameters, including the at least one designated parameter; and (iv) scaling the multivariate reference model based on the current process data of the at least one designated parameter to account for maturation of the process environment. The method further includes generating one or more current multivariate analysis process metrics that represent a current state of the process environment from the current process data; and comparing the current process metrics to the scaled reference model to determine whether the current state of the process environment is acceptable.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.