Processing apparatus
US7815425B2 · kind B2 · utility
5Cited by
17References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 28, 2005 |
| Grant date | Oct 19, 2010 |
| Priority date | — |
| Expiry date | Feb 28, 2026 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29C2043/3634
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A processing apparatus for transferring a relief pattern on a mold to a resist on a substrate through a compression of the mold against the resist, includes a supplier for supplying the resist between the substrate and the mold, and an illumination optical system for illuminating ultraviolet light onto the resist via the mold so as to cure the resist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.