Real time imprint process diagnostics for defects
US7815824B2 · kind B2 · utility
6Cited by
3References
8Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Feb 25, 2009 |
| Grant date | Oct 19, 2010 |
| Priority date | — |
| Expiry date | Mar 29, 2029 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y40/00
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Defects and/or particles during an imprint lithography process may provide exclusion zones and/or transition zones in the patterned layer. Exclusion zones and/or transition zones in the patterned layer may be identified to provide a region of interest on a template.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.