Method for purifying acetylene gas for use in semiconductor processes
US7820556B2 · kind B2 · utility
26Cited by
21References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 4, 2008 |
| Grant date | Oct 26, 2010 |
| Priority date | — |
| Expiry date | Jun 4, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02274
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Acetylene is treated to remove some residual storage solvent that may be present with the acetylene in a source of acetylene such as a container. Such treatment may be performed prior to supplying the acetylene to a deposition chamber or other reactor where acetylene is a reactant. After treatment, the acetylene gas stream has a relatively constant concentration of storage solvent, regardless of how much acetylene has been released from the acetylene source. The treatment may involve condensing the storage solvent from the gas stream at a certain temperature and separating the storage solvent from the gas stream.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.