Electrostatic chuck device
US7821767B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 27, 2005 |
| Grant date | Oct 26, 2010 |
| Priority date | — |
| Expiry date | Mar 29, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH02N13/00
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The object of this invention is to provide that an electrostatic chuck device which can properly and promptly diselectrify a substrate to be processed.In an electrostatic chuck device (11) attracting a substrate (W) to be processed on the surface of a susceptor (12) electrically, a diselectrifying circuit is provided which includes diselectrifying electrode means (16) facing the surface of the susceptor (12), a diselectrifying potential (19), and a diselectrifying resistance (17) connected between the diselectrifying electrode means (16) and the diselectrifying potential (19). The resistance value of the diselectrifying resistance (178) is established such that it is lower than that of an insulating layer (13) of the surface of the susceptor (12 and the diselectrifying resistance (17) can hold the potential of the substrate (W) during an electrostatic chuck operation, and such that the diselectrifying resistance 17) can dissipate the potential of the substrate (W) into the ground potential (19) when the electrostatic chuck is canceled. This structure can appropriately and promptly diselectrify the substrate (W).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.