Solvent mixtures for antireflective coating compositions for photoresists
US7824844B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 19, 2007 |
| Grant date | Nov 2, 2010 |
| Priority date | — |
| Expiry date | Oct 9, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0048
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least one primary organic solvent and at least one secondary organic solvent selected from any of structures 1, 2 and 3,where, R1, R3, and R4, are selected from H and C1-C6 alkyl, and R2, R5, R6, R7, R8, and R9 are selected from C1-C6 alkyl, and n=1-5. The invention also relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least 2 organic solvents, and where the antireflective coating composition has a liquid particle count at 0.2 micron of less than 100/ml after accelerated aging.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.