Patent · US Active

Method for the production of structured layers on substrates

US7825029B2 · kind B2 · utility

3Cited by

3References

38Claims

0Family size

Assignee

Schott AG · DE

Inventors

Jürgen Leib · Freising, DE
Florian Bieck · Singapore, SG
Dietrich Mund

Key dates

Filing date	Apr 15, 2003
Grant date	Nov 2, 2010
Priority date	—
Expiry date	Apr 27, 2027

Classification

Technology area (CPC H)Electricity
CPC primaryH05K3/28
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

A method for the patterned coating of a substrate with at least one surface is provided. The method is suitable for the rapid and inexpensive production of precise patterns. The method includes the steps of: producing at least one negatively patterned first coating on the at least one surface, depositing at least one second layer, which includes a material with a vitreous structure, on the surface, and at least partially removing the first coating.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.