Measurement method and apparatus, and exposure apparatus
US7826044B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 24, 2006 |
| Grant date | Nov 2, 2010 |
| Priority date | — |
| Expiry date | Apr 22, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/706
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A measurement method for measuring an optical characteristic of a target optical system includes the steps of introducing a light from each of plural patterns that reduce diffracted lights other than a predetermined order, to a different position on a pupil plane of the target optical system, the introducing step including the step of scanning the light in a radial direction in the pupil plane of the target optical system, detecting a imaging position of the light introduced by the introducing step, on an image plane of the target optical system, and obtaining the optical characteristic of the target optical system based on a detection result of the detecting step.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.