Device having etched feature with shrinkage carryover
US7829852B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 28, 2007 |
| Grant date | Nov 9, 2010 |
| Priority date | — |
| Expiry date | Jun 9, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N23/225
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
In an embodiment of the present invention, a device includes a first etched feature located in a critical dimension scanning electron microscope (CD-SEM) characterization location, the first etched feature having an upper section, a middle section, and a lower section wherein the middle section is severely shrunk relative to a corresponding middle section of a second etched feature having similar dimensions and composition that is not located in a CD-SEM characterization location. In another embodiment of the present invention, the middle section of the first etched feature has a shrinkage carryover exceeding a threshold. In still another embodiment of the present invention, the middle section of the first etched feature exhibits a line edge roughness.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.