Polyoxometallates in memory devices
US7829927B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 2, 2006 |
| Grant date | Nov 9, 2010 |
| Priority date | — |
| Expiry date | Nov 28, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11C2213/53
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
The invention relates to a DRAM memory device with a capacity associated with a field effect transistor, in which all or some of the molecules capable of storing the loads comprising a polyoxometallate are incorporated into the capacity, or a flash-type memory using at least one field effect transistor, in which the molecules capable of storing the loads comprising a polyoxometallate are incorporated into the floating grid of the transistor. The invention also relates to a method for producing on such device and to an electronic appliance comprising one such memory device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.