Method and system for yield similarity of semiconductor devices
US7831409B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 11, 2007 |
| Grant date | Nov 9, 2010 |
| Priority date | — |
| Expiry date | Apr 23, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R31/2894
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Method and system for yield similarity of semiconductor devices. Embodiments of the present invention provides a method for yield similarity of semiconductor devices. The method includes providing a first plurality of semiconductor devices and a second plurality of semiconductor devices. The method also includes obtaining a first plurality of yields associated with a first yield related to the first plurality of semiconductor devices. The method further includes obtaining a second plurality of yields associated with a second yield related to the second plurality of semiconductor devices. The method also includes providing a processor and performing a first statistical analysis for the first plurality of yields using at least the processor. The method includes determining a first statistical distribution based on at least information associated with the first statistical analysis. The method includes performing a second statistical analysis for the second plurality of yields.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.