Liquid material vaporization apparatus for semiconductor processing apparatus
US7833353B2 · kind B2 · utility
540Cited by
48References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 24, 2007 |
| Grant date | Nov 16, 2010 |
| Priority date | — |
| Expiry date | Oct 9, 2028 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/54
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A liquid material vaporization apparatus for a semiconductor processing apparatus includes: a vaporization tank; an inner partition wall disposed in the tank for dividing the interior of the tank into a charging compartment and a vaporization compartment which are liquid-communicatable with each other over an upper edge of the inner partition wall. A liquid material charged in the charging compartment overflows over the upper edge of the inner partition wall toward the vaporization compartment to store and vaporize the liquid material in the vaporization compartment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.