Amine-arresting additives for materials used in photolithographic processes
US7833692B2 · kind B2 · utility
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8References
47Claims
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Key dates
| Filing date | Mar 6, 2008 |
| Grant date | Nov 16, 2010 |
| Priority date | — |
| Expiry date | Jan 22, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31601
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Novel, poison-blocking compositions and methods of using those compositions to form poison-blocking layers are provided. The compositions comprise a typical composition used in microlithographic processes, but with a poison-blocking additive included in that composition. The preferred additive is a compound comprising one or more blocked isocyanates. Upon heating to certain temperatures, the blocking group is released from the isocyanate, leaving behind a moiety that is highly reactive with the poisonous amines generated by typical dielectric layers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.