Auto focus system for reticle inspection
US7835015B1 · kind B1 · utility
6Cited by
11References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 4, 2008 |
| Grant date | Nov 16, 2010 |
| Priority date | — |
| Expiry date | Jan 3, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B2210/56
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods and apparatus relating to the inspection of photomasks are described. In an embodiment, an inspection tool may be automatically focused on a reticle utilizing various topographic mapping techniques. Other embodiments are also described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.