Methods of making molybdenum titanium sputtering plates and targets

US7837929B2 · kind B2 · utility

Assignee

• H.C. STARCK INC. · US

Inventors

• Mark E. Gaydos · Nashua, US
• Prabhat Kumar · Framingham, US
• Steven A. Miller · Pinellas Park, US
• Norman C. Mills · Phoenix, US
• Gary Alan Rozak · Akron, US
• Rong-Chein Richard Wu · Taipei, TW

Key dates

• Filing date: Oct 20, 2005
• Grant date: Nov 23, 2010
• Expiry date: Oct 20, 2025

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B22F2998/10
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

Molybdenum titanium sputter targets are provided. In one aspect, the targets are substantially free of the β(Ti, Mo) alloy phase. In another aspect, the targets are substantially comprised of single phase β(Ti, Mo) alloy. In both aspects, particulate emission during sputtering is reduced. Methods of preparing the targets, methods of bonding targets together to produce large area sputter targets, and films produced by the targets, are also provided.