Patent · US Active

Method and apparatus for personalization of semiconductor

US7842525B2 · kind B2 · utility

13Cited by
9References
9Claims
0Family size

Assignee

Inventor

Key dates

Filing dateOct 31, 2007
Grant dateNov 30, 2010
Priority date
Expiry dateJun 23, 2028

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/0002
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A system for making small modifications to the pattern in standard processed semiconductor devices. The modifications are made to create a small variable part of the pattern against a large constant part of the same pattern. In a preferred embodiment the exposure of the variable and constant parts are done with the same wavelength in the same combined stepper and code-writer. The invention devices a way of writing variable parts of the chip that is automatic, inexpensive and risk-free. A system for automatic design and production of die-unique patterns is also shown.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.