Processing apparatus and method
US7846346B1 · kind B1 · utility
2Cited by
4References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 14, 2006 |
| Grant date | Dec 7, 2010 |
| Priority date | — |
| Expiry date | Sep 4, 2029 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29C2043/025
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A processing method for transferring a relief pattern of a mold to a resist includes the steps of compressing the mold having the relief pattern against the resist on a substrate, irradiating an exposure light onto the resist through the mold, vibrating the mold and the substrate relative to each other during the irradiating step, and releasing the mold from the resist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.