Patent · US Active

Tin oxide-based sputtering target, transparent and conductive films, method for producing such films and composition for use therein

US7850876B2 · kind B2 · utility

0Cited by
9References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 11, 2008
Grant dateDec 14, 2010
Priority date—
Expiry dateNov 11, 2028

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/24364
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

The present invention is directed to a composition consisting essentially of:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.