Secure photomask with blocking aperture
US7851110B2 · kind B2 · utility
5Cited by
49References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 18, 2008 |
| Grant date | Dec 14, 2010 |
| Priority date | — |
| Expiry date | Feb 26, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/38
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A secure photomask including a substrate having one or more pattern layers formed thereon and a blocking aperture disposed below the one or more pattern layers that prevents at least one of unauthorized use and copying of the photomask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.