Patent · US Active

Composition for removing an insulation material, method of removing an insulation layer and method of recycling a substrate using the same

US7851372B2 · kind B2 · utility

2Cited by
7References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 2, 2006
Grant dateDec 14, 2010
Priority date
Expiry dateNov 18, 2027

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/02079
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

In one aspect, a composition is provided which is capable of removing an insulation material which includes at least one of a low-k material and a passivation material. The composition of this aspect includes about 5 to about 40 percent by weight of a fluorine compound, about 0.01 to about 20 percent by weight of a first oxidizing agent, about 10 to about 50 percent by weight of a second oxidizing agent, and a remaining water.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.