Reflecting mask, apparatus for fixing the reflecting mask and method of fixing the reflecting mask
US7855034B2 · kind B2 · utility
0Cited by
3References
4Claims
0Family size
Assignee
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Key dates
| Filing date | Jul 24, 2007 |
| Grant date | Dec 21, 2010 |
| Priority date | — |
| Expiry date | Apr 23, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70708
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
In a reflecting mask, an apparatus for fixing the reflecting mask and a method of fixing the reflecting mask, voltages are applied to elements of a conductive pattern spaced apart from each other on a rear face of the reflecting mask to fix the reflecting mask by using electrostatic forces. A flatness of the fixed reflecting mask is measured, and the electrostatic forces provided to portions of the reflecting mask are selectively adjusted in accordance with a measured result obtained from the measuring part, such that the reflecting mask is horizontally fixed and is substantially flat.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.