System, method and computer software product for inspecting charged particle responsive resist
US7856138B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 23, 2006 |
| Grant date | Dec 21, 2010 |
| Priority date | — |
| Expiry date | Sep 6, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/84
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system software product and a method for evaluating a mask, the method including the stages of: defining multiple CD measurement target windows; defining multiple pattern recognition windows such that the multiple CD measurements windows do not overlap the multiple pattern recognition windows, wherein each CD measurement target window and an associated pattern recognition window are positioned within a measurement area that is scannable without introducing a substantial mechanical movement; performing multiple critical dimension measurements of multiple patterns of an object being manufactured by exposing the mask to radiation, wherein the performing comprises using at least one CD measurement target window and at least one pattern recognition window; and evaluating the mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.