Patent · US Active

Illumination optics for projection microlithography

US7858957B2 · kind B2 · utility

3Cited by

5References

25Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Berndt Warm · Arnstorf, DE
Guenther Dengel · Heidenheim, DE

Key dates

Filing date	Nov 27, 2007
Grant date	Dec 28, 2010
Priority date	—
Expiry date	Feb 18, 2029

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70116
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Illumination optics that can be used, for example, for EUV projection microlithography are disclosed. Also disclosed are illumination systems provided with such illumination optics, projection exposure apparatuses provided with such illumination systems, related methods of manufacturing microstructured elements, and microstructured elements obtained by these methods.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.