Heat processing apparatus, method of automatically tuning control constants, and storage medium
US7860585B2 · kind B2 · utility
1Cited by
6References
21Claims
0Family size
Assignee
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Key dates
| Filing date | Apr 11, 2008 |
| Grant date | Dec 28, 2010 |
| Priority date | — |
| Expiry date | May 25, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67248
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A heat processing apparatus includes a reaction vessel, a heating unit in the reaction vessel to heat the processing region, a temperature detector that detects temperature in the processing region, and a control part to control the heating unit by PID control. The control part has a rule table, and a performance unit that obtains temperature profiles and calculates differences between actually measured temperatures and target values. It refers to the rule table change the PID constants. The control part also updates relationships between PID constants and predicted temperature change amounts.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.