Method for forming micro lenses and semiconductor device including the micro lenses
US7862732B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 12, 2007 |
| Grant date | Jan 4, 2011 |
| Priority date | — |
| Expiry date | Aug 24, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B3/0012
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
In a method for forming micro lenses, a lens material layer made of an inorganic material is formed on a substrate, and an intermediate layer made of an organic material is formed on the lens material layer. Then, a mask layer made of an organic material is formed on the intermediate layer, and lens shapes are formed in the mask layer. The lens shapes of the mask layer are transcribed to the intermediate layer by etching the mask layer and the intermediate layer. Thereafter, the lens shapes of the intermediate layer are transcribed to the lens material layer to form micro lenses by etching the intermediate layer and the lens material layer using a processing gas containing SF6 gas and CHF3 gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.