Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same
US7862980B2 · kind B2 · utility
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10References
21Claims
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Key dates
| Filing date | Jul 30, 2007 |
| Grant date | Jan 4, 2011 |
| Priority date | — |
| Expiry date | Jul 25, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/123
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a salt represented by the formula (I):wherein P1, P2, P3, Q1, Q2 and R are defined in the specification and the present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.