Patent · US Active

Device and method for determining an optical property of a mask

US7864319B2 · kind B2 · utility

0Cited by

3References

15Claims

0Family size

Assignee

Vistec Semiconductor Systems GmbH · DE

Inventors

Hans-Artur Boesser · Breidenbach, DE
Michael Heiden · Blieskastel, DE
Klaus Rinn · Heuchelheim, DE
Frank Laske · Weilmünster, DE

Key dates

Filing date	Aug 20, 2008
Grant date	Jan 4, 2011
Priority date	—
Expiry date	Jul 21, 2029

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/84
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A coordinate measuring machine (1) including a plane (25a) in which there is arranged a movable measurement table (20) moving the mask (2) correspondingly in the plane (25a), at least one objective (9) and a detector (11), an incident light source (14) arranged to provide incident light and/or a transmitted light source (6) arranged to provide transmitted light, wherein the mask (2) has at least a first area (41) and a second area (42), wherein the first area (41) and the second area (42) comprise different materials differing in their transmission or reflection properties.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.