Post-release adjustment of interferometric modulator reflectivity
US7864403B2 · kind B2 · utility
12Cited by
159References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 27, 2009 |
| Grant date | Jan 4, 2011 |
| Priority date | — |
| Expiry date | Mar 28, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/201
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In various embodiments, devices, methods, and systems for adjusting the reflectivity spectrum of a microelectromechanical systems (MEMS) device are described herein. The method comprises depositing a reflectivity modifying layer with the optical cavity of an interferometric modulator, where the reflectivity modifying layer shifts or trims the shape of the interferometric modulator's wavelength reflectivity spectrum relative to the absence of the reflectivity modifying layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.