Patent · US Active

Lithographic apparatus and device manufacturing method with reticle gripper

US7869003B2 · kind B2 · utility

30Cited by

3References

21Claims

0Family size

Assignee

ASML Holding N.V. · NL

Inventors

Matthew J. Van Doren · Pleasanton, US
Jonathan H. Feroce · Shelton, US

Key dates

Filing date	Jul 12, 2006
Grant date	Jan 11, 2011
Priority date	—
Expiry date	Feb 1, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70783
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A reticle gripper to hold a reticle of a lithographic apparatus is presented. The reticle gripper includes three gripper structures to contact the surface of the reticle. Each of the three gripper structures determines a position with respect to the reticle gripper of one of the points on the surface of the reticle.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.