Patent · US Active

Substrate support lift mechanism

US7871470B2 · kind B2 · utility

12Cited by
113References
6Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 26, 2006
Grant dateJan 18, 2011
Priority date
Expiry dateNov 8, 2029

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/68785
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

An apparatus for positioning a substrate support within a processing chamber is provided. In one embodiment, an apparatus for positioning a substrate support includes a yoke comprising a curved surface with a first slot formed therethrough, a base comprising a first surface adapted to support the substrate support and a curved second surface, wherein the curved second surface mates with the curved surface of the yoke and a first slot is formed through the curved second surface of the base, and a first threaded member disposed through the first slot in the yoke and the first slot in the base.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.