Patent · US Active

Method for forming micro lenses

US7875196B2 · kind B2 · utility

1Cited by
16References
12Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJul 30, 2009
Grant dateJan 25, 2011
Priority date—
Expiry dateJul 30, 2029

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10F39/8063
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method for forming micro lenses includes the step of performing an etching treatment to an object to be processed, which includes a lens material layer and a mask layer having lens shapes and formed on the lens material layer, using an etching gas including SF6 gas and CHF3 gas, an etching gas including SF6 gas and CO gas, an etching gas including a gas having therein carbon and fluorine and CO gas, or an etching gas including two or more kinds of gases from a first gas having therein carbon and fluorine and a second gas having therein carbon and fluorine, to etch the lens material layer and the mask layer and transfer the lens shapes of the mask layer to the lens material layer, thereby forming the micro lenses.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.