Helical pixilated photoresist
US7875415B2 · kind B2 · utility
2Cited by
5References
4Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 30, 2005 |
| Grant date | Jan 25, 2011 |
| Priority date | — |
| Expiry date | Mar 8, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0392
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A helical pixilated photoresist includes a photoacid generator, a photoimageable polymer comprising a self-assembly moiety and a solubility switch, the photoimageable polymer having a helical structure. In one embodiment the helical pixilated photoresist is formed of a photoimageable polymer comprising a pyridine-based quencher copolymer and a solubility switch copolymer, wherein the photoimageable polymer has a helical structure formed by pi-stacking of the pyridine-based quencher copolymer. The helical pixilated photoresist is applied to a substrate and irradiated and developed to form a patterned photoresist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.