Patent · US Active

EUV illumination system with a system for measuring fluctuations of the light source

US7875865B2 · kind B2 · utility

5Cited by

9References

29Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Axel Scholz · Aalen, DE
Markus Weiss · Aalen, DE
Manfred Maul · Aalen, DE
Philipp Bosselmann · Frankfurt, DE

Key dates

Filing date	Apr 7, 2008
Grant date	Jan 25, 2011
Priority date	—
Expiry date	Jan 16, 2029

Classification

Technology area (CPC H)Electricity
CPC primaryH05G2/00
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.