Patent · US Active

Micromechanical system including a suspension and an electrode positioned movably

US7878061B2 · kind B2 · utility

3Cited by
1References
11Claims
0Family size

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Key dates

Filing dateNov 26, 2008
Grant dateFeb 1, 2011
Priority date
Expiry dateNov 26, 2028

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01P15/0802
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A micromechanical system includes a substrate, a first planar electrode, a second planar electrode, and a third planar electrode. The second planar electrode is movably positioned at a distance above the first planar electrode and the third planar electrode is positioned at a distance above the second electrode.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.